Meijie Superhard Materials – Precision Tools for Global Manufacturing.
Single crystal silicon and silicon carbide wafer edge grinding and chamfering.Semiconductor wafer manufacturing field.

Core Advantages

  • Superior Sharpness

    Superior Sharpness

    High-quality diamond abrasive combined with an exclusive formula delivers outstanding sharpness, ensuring a highly efficient and smooth edging process, which greatly improves overall processing efficiency.
  • Excellent Heat Dissipation & Chip Removal

    Excellent Heat Dissipation & Chip Removal

    The dense and uniform tooth structure guarantees sufficient cooling during edging, enables unobstructed chip discharge, and avoids processing quality defects caused by heat accumulation.
  • Premium Compatibility & Stability

    Premium Compatibility & Stability

    It is fully compatible with double edging machines of all brands. Its structural design perfectly fits the equipment operation requirements, delivering exceptional running stability and more controllable processing accuracy during use.

Key Parameters

Mill diameter (D)Φ200
Shaft diameter (d)Φ30
Trough typeU-shaped
Mesh (#)800#, 1200#
Processing object6-inch and 8-inch silicon carbide wafers
Equipment speed (r)28000r/min
Feed rate (vf)200-400mm/min
Grinding amount (ae)0.3-0.5mm
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